Anne-Marie Goethals

Variable-threshold resist models for lithography simulation

John N. Randall, Kurt Ronse, T. Marschner et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 31 citations

Device Modeling, Engineering, Specific Resistance +13

EUV Resist Process Performance Investigations on the NXE3100 Full Field Scanner

Anne-Marie Goethals, Philippe Foubert, Kohei Hosokawa et al. · Journal of Photopolymer Science and Technology · 2012 · 30 citations · Full text

Hp Contacts, Electrical Engineering, Wafer Scale Processing +12

Readiness of EUV Lithography for Insertion into Manufacturing: The IMEC EUV Program

Eric Hendrickx, Roel Gronheid, Jan Hermans et al. · Journal of Photopolymer Science and Technology · 2013 · 18 citations · Full text

Engineering, Electron-beam Lithography, Electronic Design Automation +20

Investigation of EUV mask defectivity via full-field printing and inspection on wafer

R. Jonckheere, Dieter Van den Heuvel, Fumio Iwamoto et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 18 citations

Engineering, Electron-beam Lithography, Mechanical Engineering +17

Dependence of EUV mask printing performance on blank architecture

R. Jonckheere, Yoonsuk Hyun, Fumio Iwamoto et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 12 citations

Engineering, Electron-beam Lithography, Electronic Design Automation +17