Hyun Woo Tak

Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide

Hyun Woo Tak, Hye Joo Lee, Long Wen et al. · Applied Surface Science · 2022 · 33 citations

Natural Sciences, Materials Engineering, Materials Science +17

Characteristics of high aspect ratio SiO2 etching using C4H2F6 isomers

Hye Joo Lee, Hyun Woo Tak, Seong Bae Kim et al. · Applied Surface Science · 2023 · 25 citations

Engineering, Materials Engineering, Materials Science +11

Effects of superimposed dual-frequency (13.56/2 MHz) inductively coupled plasma source on the uniformity of Ar/CF4 plasma

Kyung Chae Yang, Ye Ji Shin, Hyun Woo Tak et al. · Vacuum · 2019 · 22 citations

Natural Sciences, Physics, Plasma Physics +6

Plasma Induced Damage Reduction of Ultra Low-k Dielectric by Using Source Pulsed Plasma Etching for Next BEOL Interconnect Manufacturing

Jun Ki Jang, Hyun Woo Tak, Ye Ji Shin et al. · IEEE Transactions on Semiconductor Manufacturing · 2020 · 18 citations

Natural Sciences, Electrical Engineering, Materials Science +17

A comparative study of C_<i>x</i>(<i>x</i> = 4, 5, 7)F₈ plasmas for dry etch processing

Da In Sung, Hyun Woo Tak, Dong Woo Kim et al. · Materials Express · 2020 · 16 citations

Natural Sciences, Materials Engineering, Materials Science +16