Kyung Chae Yang

Effect of pulse phase lag in the dual synchronized pulsed capacitive coupled plasma on the etch characteristics of SiO2 by using a C4F8/Ar/O2 gas mixture

Min Hwan Jeon, Kyung Chae Yang, Kyong Nam Kim et al. · Vacuum · 2015 · 21 citations

Engineering, Applied Physics, Etch Characteristics +6

Effects of superimposed dual-frequency (13.56/2 MHz) inductively coupled plasma source on the uniformity of Ar/CF4 plasma

Kyung Chae Yang, Ye Ji Shin, Hyun Woo Tak et al. · Vacuum · 2019 · 19 citations

Plasma Application, Ar/cf4 Plasma, Plasma Science +1

SiO2 etch characteristics and environmental impact of Ar/C3F6O chemistry

Hoseok Lee, Kyung Chae Yang, Soo Gang Kim et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2018 · 17 citations

A study on the etching characteristics of magnetic tunneling junction materials using DC pulse-biased inductively coupled plasmas

Kyung Chae Yang, Min Hwan Jeon, Geun Young Yeom · Japanese Journal of Applied Physics · 2014 · 13 citations

Engineering, Plasma Processing, Magnetism +17

Effect of Structure and Material Variation of Focus Ring for Enhanced Etch Resistance

Kyung Chae Yang, Sung-Woo Park, Ho Seok Lee et al. · Nanoscience and Nanotechnology Letters · 2017 · 10 citations