Kyong Nam Kim

Controlled MoS₂ layer etching using CF₄ plasma

Min Hwan Jeon, Chisung Ahn, Hyeong‐U Kim et al. · Nanotechnology · 2015 · 63 citations

Materials Science, Materials Engineering, Chemical Engineering +15

Cyclic chlorine trap-doping for transparent, conductive, thermally stable and damage-free graphene

Phuong V. Pham, Kyong Nam Kim, Min Hwan Jeon et al. · Nanoscale · 2014 · 50 citations

Synergetic effects in a discharge produced by a dual frequency–dual antenna large-area ICP source

Anurag Mishra, Kyong Nam Kim, Tae Hyung Kim et al. · Plasma Sources Science and Technology · 2012 · 28 citations

Engineering, Plasma Science, Plasma Physics +16

Chlorine Radical Doping of a Few Layer Graphene with Low Damage

Kyong Nam Kim, Phuong V. Pham, Geun Young Yeom · ECS Journal of Solid State Science and Technology · 2015 · 28 citations · Full text

Engineering, Chlorine Radical Doping, Chlorine Radicals +17

Plasma Characteristics of Inductively Coupled Plasma Using Dual-Frequency Antennas

Tae Hyung Kim, Kyong Nam Kim, Anurag Kumar Mishra et al. · Japanese Journal of Applied Physics · 2013 · 25 citations

Electrical Engineering, Plasma Characteristics, Plasma Uniformity +8