Concepedia

Tomohiro Iijima

TI

Statistics

Publications

12

Citations

178

H-Index

10

Active since

1997

Affiliations

Toshiba (Japan)(Current)

Gunma University

National Institute of Technology, Numazu College

Tomohiro Iijima is an author at Toshiba (Japan) specializing in engineering, semiconductor devices, and electron beam lithography.

Publications per year

1997–2015

12

Publications

12

High-Accuracy Proximity Effect Correction for Mask Writing

Takayuki Abe, Yoshiaki Hattori, Tomohiro Iijima et al. · Japanese Journal of Applied Physics · 2007 · 32 citations

Engineering, Computer Science, Computational Electromagnetics +12

Shear Wave Wavefront Mapping Using Ultrasound Color Flow Imaging

Yoshiki Yamakoshi, Toshihiro Kasahara, Tomohiro Iijima et al. · Ultrasonic Imaging · 2015 · 20 citations

Medicine, Biomedical Engineering, Radiology +16

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 17 citations

Engineering, Electrical Engineering, Manufacturing Engineering +13

Copper contamination induced degradation of MOSFET characteristics and reliability

M. Inohara, Hiromu Sakurai, Tomohiro Yamaguchi et al. · 2002 · 16 citations

Engineering, Electrical Engineering, Materials Science +15

Global Critical Dimension Correction: I. Fogging Effect Correction

Takayuki Abe, Junichi Suzuki, Jun Yashima et al. · Japanese Journal of Applied Physics · 2007 · 15 citations

Engineering, Electrical Engineering, Optoelectronics +10

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