Statistics
Publications
5
Citations
66
H-Index
5
Active since
2007
Affiliations
Jun Yashima is an author at National Institute of Technology, Numazu College specializing in semiconductor devices, electron beam lithography, and engineering.
Publications per year
2007–2016
5
5
EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond
Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 17 citations
Engineering, Electrical Engineering, Manufacturing Engineering +13
Electron beam mask writer EBM-9500 for logic 7nm node generation
Hideki Matsui, Takashi Kamikubo, Satoshi Nakahashi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 13 citations
Engineering, Electrical Engineering, Manufacturing Engineering +14
EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond
Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 10 citations
Engineering, Electrical Engineering, Manufacturing Engineering +13
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