Kiichiro Mukai

Leakage‐Current Increase in Amorphous Ta2 O 5 Films Due to Pinhole Growth during Annealing Below 600°C

Shin’ichiro Kimura, Yasushiro Nishioka, Akira Shintani et al. · Journal of The Electrochemical Society · 1983 · 81 citations

Natural Sciences, Materials Engineering, Materials Science +16

Dielectric Characteristics of Double Layer Structure of Extremely Thin Ta2 O 5 / SiO2 on Si

Yasushiro Nishioka, Shin’ichiro Kimura, H. Shinriki et al. · Journal of The Electrochemical Society · 1987 · 74 citations

Natural Sciences, Materials Engineering, Materials Science +17

Influence of SiO2 at the Ta2O5/Si interface on dielectric characteristics of Ta2O5 capacitors

Yasushiro Nishioka, H. Shinriki, Kiichiro Mukai · Journal of Applied Physics · 1987 · 57 citations

Natural Sciences, Materials Engineering, Materials Science +17

Dielectric characteristics of fluorinated ultradry SiO2

Yasushiro Nishioka, Yuzuru Ohji, Kiichiro Mukai et al. · Applied Physics Letters · 1989 · 52 citations

Engineering, Materials Engineering, Materials Science +17

A New Transistor with Two‐Level Metal Electrodes

Atsushi Saiki, Seiki Harada, T. Okubo et al. · Journal of The Electrochemical Society · 1977 · 43 citations

Engineering, Electrical Engineering, Materials Science +16