S.H. Bae

MOS characteristics of ultrathin CVD HfAlO gate dielectrics

S.H. Bae, C.H. Lee, Robert D. Clark et al. · IEEE Electron Device Letters · 2003 · 79 citations

Natural Sciences, Materials Engineering, Materials Science +17

Integration of Dual Metal Gate CMOS on High-k Dielectrics Utilizing a Metal Wet Etch Process

Zhibo Zhang, S. C. Song, C. Huffman et al. · Electrochemical and Solid-State Letters · 2005 · 39 citations

Engineering, Electrical Engineering, Materials Engineering +17

Three-Layer laminated metal gate electrodes with tunable work functions for CMOS applications

Weiping Bai, S.H. Bae, H.C. Wen et al. · IEEE Electron Device Letters · 2005 · 32 citations

Engineering, Electrical Engineering, Materials Engineering +17

Integration of dual metal gate CMOS with TaSiN (NMOS) and Ru (PMOS) gate electrodes on HfO/sub 2/ gate dielectric

Z.B. Zhang, Sook‐Keun Song, C. Huffman et al. · 2005 · 25 citations

Engineering, Electrical Engineering, Materials Science +17

Laminated metal gate electrode with tunable work function for advanced CMOS

S.H. Bae, Weiping Bai, H.C. Wen et al. · 2004 · 19 citations

Engineering, Electrical Engineering, Materials Science +17