M. Toledano-Luque

Optical properties and structure of HfO₂thin films grown by high pressure reactive sputtering

F. L. Martı́nez, M. Toledano-Luque, J.J. Gandı́a et al. · Journal of Physics D Applied Physics · 2007 · 184 citations · Full text

Atomistic approach to variability of bias-temperature instability in circuit simulations

B. Kaczer, Swaraj Bandhu Mahato, Vinícius Valduga de Almeida Camargo et al. · 2011 · 129 citations

Engineering, Computational Chemistry, Defect Tolerance +18

Impact of single charged gate oxide defects on the performance and scaling of nanoscaled FETs

J. Franco, B. Kaczer, M. Toledano-Luque et al. · 2012 · 91 citations

Engineering, Scaling Rule, Oxide Defect +16

A comparative study of the electrical properties of TiO₂films grown by high-pressure reactive sputtering and atomic layer deposition

S. Dueñas, Helena Castán, H. García et al. · Semiconductor Science and Technology · 2005 · 83 citations · Full text

From mean values to distributions of BTI lifetime of deeply scaled FETs through atomistic understanding of the degradation

M. Toledano-Luque, B. Kaczer, J. Franco et al. · 2011 · 82 citations

Atomistic Understanding, Engineering, Mean Values +19