S. Dueñas

A comparative study of the electrical properties of TiO₂films grown by high-pressure reactive sputtering and atomic layer deposition

S. Dueñas, Helena Castán, H. García et al. · Semiconductor Science and Technology · 2005 · 83 citations · Full text

Admittance spectroscopy in junctions

J. Barbolla, S. Dueñas, L. Bailón · Solid-State Electronics · 1992 · 78 citations

Engineering, Tunneling Microscopy, Physics +4

Electrical characteristics of metal-insulator-semiconductor structures with atomic layer deposited Al2O3, HfO2, and nanolaminates on different silicon substrates

F. Campabadal, J.M. Rafı́, M. Zabala et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2011 · 56 citations

Engineering, Metal-insulator-semiconductor Structures, Silicon On Insulator +17

Influence of single and double deposition temperatures on the interface quality of atomic layer deposited Al2O3 dielectric thin films on silicon

S. Dueñas, Helena Castán, H. García et al. · Journal of Applied Physics · 2006 · 51 citations

Double Deposition Temperatures, Engineering, Chemical Deposition +19

Deposition of SiNx:H thin films by the electron cyclotron resonance and its application to Al/SiNx:H/Si structures

Susana Ramírez García, I. Mártil, G. González-Dı́az et al. · Journal of Applied Physics · 1998 · 48 citations · Full text

Engineering, Electron Cyclotron Resonance, Thin Film Process Technology +20