H. García

A comparative study of the electrical properties of TiO₂films grown by high-pressure reactive sputtering and atomic layer deposition

S. Dueñas, Helena Castán, H. García et al. · Semiconductor Science and Technology · 2005 · 83 citations · Full text

Electrical characteristics of metal-insulator-semiconductor structures with atomic layer deposited Al2O3, HfO2, and nanolaminates on different silicon substrates

F. Campabadal, J.M. Rafı́, M. Zabala et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2011 · 56 citations

Engineering, Metal-insulator-semiconductor Structures, Silicon On Insulator +17

Influence of single and double deposition temperatures on the interface quality of atomic layer deposited Al2O3 dielectric thin films on silicon

S. Dueñas, Helena Castán, H. García et al. · Journal of Applied Physics · 2006 · 51 citations

Double Deposition Temperatures, Engineering, Chemical Deposition +19

Electrical Properties of Atomic-Layer-Deposited Thin Gadolinium Oxide High-k Gate Dielectrics

S. Dueñas, Helena Castán, H. García et al. · Journal of The Electrochemical Society · 2007 · 39 citations

Engineering, Cubic Thin Films, Silicon On Insulator +18

Experimental verification of intermediate band formation on titanium-implanted silicon

Helena Castán, E. Pérez, H. García et al. · Journal of Applied Physics · 2013 · 38 citations · Full text

Materials Science, Intermediate Band Formation, Electrical Engineering +13