Hirohito Anze

High-Accuracy Proximity Effect Correction for Mask Writing

Takayuki Abe, Yoshiaki Hattori, Tomohiro Iijima et al. · Japanese Journal of Applied Physics · 2007 · 32 citations

Engineering, Computer Science, Computational Electromagnetics +12

Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

Takashi Kamikubo, Takayuki Ohnishi, Shigehiro Hara et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 17 citations

Engineering, Materials Engineering, Materials Science +10

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 17 citations

Engineering, Electrical Engineering, Manufacturing Engineering +13

Global Critical Dimension Correction: I. Fogging Effect Correction

Takayuki Abe, Junichi Suzuki, Jun Yashima et al. · Japanese Journal of Applied Physics · 2007 · 15 citations

Engineering, Electrical Engineering, Optoelectronics +10

Study of heating effect on CAR in electron beam mask writing

Takashi Kamikubo, Makoto Hiramoto, Jun Yashima et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 11 citations

Engineering, Electrical Engineering, Physics +14