Toshiyuki Kai

Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified Resist for Extreme Ultraviolet Lithography

Ryo Hirose, Takahiro Kozawa, Seiichi Tagawa et al. · Japanese Journal of Applied Physics · 2007 · 108 citations

Optical Materials, Engineering, Electron-beam Lithography +16

Analysis of acid yield generated in chemically amplified electron beam resist

Takahiro Kozawa, Takumi Shigaki, Kazumasa Okamoto et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2006 · 99 citations

Engineering, Electron-beam Lithography, Acid Generation +17

Acid Generation Mechanism of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Post-Optical Lithography: Acid Yield and Deprotonation Behavior of Poly(4-hydroxystyrene) and Poly(4-methoxystyrene)

Atsuro Nakano, Takahiro Kozawa, Kazumasa Okamoto et al. · Japanese Journal of Applied Physics · 2006 · 80 citations

Engineering, Electron-beam Lithography, Chemistry +20

Dependence of Acid Generation Efficiency on Molecular Structures of Acid Generators upon Exposure to Extreme Ultraviolet Radiation

Ryo Hirose, Takahiro Kozawa, Seiichi Tagawa et al. · Applied Physics Express · 2008 · 66 citations

Ultraviolet Light, Short Wavelength Optic, Optical Materials +22

Sensitization Distance and Acid Generation Efficiency in a Model System of Chemically Amplified Electron Beam Resist with Methacrylate Backbone Polymer

Takahiro Kozawa, Seiichi Tagawa, Toshiyuki Kai et al. · Journal of Photopolymer Science and Technology · 2007 · 57 citations · Full text

Engineering, Electron-beam Lithography, Acid Generation Efficiency +16