A. Akheyar

Ni- and Co-based silicides for advanced CMOS applications

J. A. Kittl, A. Lauwers, O. Chamirian et al. · Microelectronic Engineering · 2003 · 114 citations

Engineering, Nanoelectronics, Applied Physics +6

Fully depleted SOI CMOS technology for heterogeneous micropower, high-temperature or RF microsystems

Denis Flandre, Stéphane Adriaensen, A. Akheyar et al. · Solid-State Electronics · 2001 · 88 citations

Low-power Electronics, Electrical Engineering, Engineering +9

Ruthenium gate electrodes on SiO2 and HfO2: Sensitivity to hydrogen and oxygen ambients

L. Pantisano, T. Schram, Z. Li et al. · Applied Physics Letters · 2006 · 48 citations

Materials Science, Oxide Heterostructures, Engineering +13

Immobilization of DNA on CMOS compatible materials

P.E. Lobert, Dominique Bourgeois, Rémi Pampin et al. · Sensors and Actuators B Chemical · 2003 · 39 citations

Dna Nanotechnology, Engineering, Bioelectronics +6

Effective work function modulation by controlled dielectric monolayer deposition

L. Pantisano, T. Schram, B. J. O’Sullivan et al. · Applied Physics Letters · 2006 · 31 citations

Materials Science, Device Modeling, Electrical Engineering +15