Ioana Graur

Process window OPC for reduced process variability and enhanced yield

Azalia A. Krasnoperova, James Culp, Ioana Graur et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 30 citations

Engineering, Electron-beam Lithography, Energy Efficiency +20

Optimizing style options for subresolution assist features

Lars W. Liebmann, James A. Bruce, W. H. Chu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 30 citations

Sraf Style Options, Engineering, Electronic Design Automation +20

Improving yield through the application of process window OPC

Jaione Tirapu-Azpiroz, Azalia A. Krasnoperova, S. Siddiqui et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 21 citations

Engineering, Process Aware Opc, Program Analysis +14

Alternating phase-shifted mask for logic gate levels, design, and mask manufacturing

Lars W. Liebmann, Ioana Graur, William C. Leipold et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 21 citations

Engineering, Vlsi Design, Mask Manufacturing +17

Enhanced OPC recipe coverage and early hotspot detection through automated layout generation and analysis

Ayman Hamouda, Mohamed Bahnas, Dan Schumacher et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 14 citations