William C. Leipold

TCAD development for lithography resolution enhancement

Lars W. Liebmann, Scott Mansfield, Alfred K. K. Wong et al. · IBM Journal of Research and Development · 2001 · 74 citations

Wafer Scale Processing, Engineering, Vlsi Design +14

A functional FinFET-DGCMOS SRAM cell

E. Nowak, B.A. Rainey, David Fried et al. · 2003 · 41 citations

Electrical Engineering, Cell Size, Engineering +9

Optimizing style options for subresolution assist features

Lars W. Liebmann, James A. Bruce, W. H. Chu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 30 citations

Sraf Style Options, Engineering, Electronic Design Automation +20

Alternating phase-shifted mask for logic gate levels, design, and mask manufacturing

Lars W. Liebmann, Ioana Graur, William C. Leipold et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 21 citations

Engineering, Vlsi Design, Mask Manufacturing +17

Theoretical consideration of band-structure determination from tunneling in thin-film heterojunctions

William C. Leipold, T. E. Feuchtwang · Physical review. B, Solid state · 1974 · 14 citations

Materials Science, Electrical Engineering, Engineering +14