G. Bleidießel - Concepedia

Author

G. Bleidießel

Micro Resist Technology (Germany)

Also Known As

G. Bleidiessel, G. Bleidießel, Gerhard Bleidiessel

Publications

448

Citations

H-Index

Concepts

All Affiliations

Micro Resist Technology (Germany)University of Wuppertal VTT Technical Research Centre of Finland Nantes Université

About

G. Bleidießel is an author at Micro Resist Technology (Germany) specializing in engineering, materials science, and 3d printing.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	7	7	436
2	Applied Physics	3	3	91
3	Biomedical Engineering	1	1	64
4	Chemical Engineering	1	1	68
5	Electrical Engineering	1	1	18

G. Bleidießel

Publications

436

Citations

H-Index

Page 1

	Year	Citations
Nanoimprint lithography: an alternative nanofabrication approach S. Zankovych, J. Seekamp, A. Kam, Materials Science and Engineering C Materials ScienceEngineeringNanoimprint LithographyBeam LithographyMicrofabrication	2003	176
New polymer materials for nanoimprinting H. Schulz, Hella‐Christin Scheer, Thomas Hoffmann, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceThermoset PolymersPolymer ChemistryChemical EngineeringNew Aromatic Polymers	2000	68
Master replication into thermosetting polymers for nanoimprinting H. Schulz, D. Lyebyedyev, Hella‐Christin Scheer, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringReplication QualityNanostructured PolymerBiomedical EngineeringPositive Replicas	2000	64
Multistep profiles by mix and match of nanoimprint and UV lithography K. Pfeiffer, Mathias Fink, G. Gruetzner, Microelectronic Engineering EngineeringElectron-beam LithographyBeam LithographyMicrofabricationNanotechnology	2001	42
Novel linear and crosslinking polymers for nanoimprinting with high etch resistance K. Pfeiffer, Mathias Fink, G. Bleidießel, Microelectronic Engineering Materials SciencePolymer ChemistryEngineeringPolymer TechnologyHigh Etch Resistance	2000	37
Suitability of new polymer materials with adjustable glass temperature for nano-imprinting K. Pfeiffer, G. Bleidießel, G. Gruetzner, Microelectronic Engineering Materials ScienceEngineeringPolymer TechnologyNanomaterialsPolymer Science	1999	31
High density fluorocarbon plasma etching of new resists suitable for nano-imprint lithography Freddy Gaboriau, M. C. Peignon, A. Barreau, Microelectronic Engineering Materials ScienceElectrical EngineeringNano-imprint LithographyEngineeringElectron-beam Lithography	2000	18

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