Thomas Hoffmann - Concepedia

Author

Thomas Hoffmann

Also Known As

Dombrowski, K.F., Hoffmann, T., Hoffmann, Thomas, Hoffmann, Thomas R. (Thomas Roy), 1953-, T Hoffmann, T. HOFFMANN, T. Hoffmann, T. R. HOFFMANN, T. Y. Hoffmann, THOMAS HOFFMANN

287

Publications

5.5K

Citations

H-Index

186

Concepts

All Affiliations

IMEC KU Leuven Leibniz Institute for Agricultural Engineering and Bioeconomy University of Wuppertal Research Foundation - Flanders

About

Thomas Hoffmann is an author at IMEC specializing in engineering, electrical engineering, and microelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	31	83	4.1K
2	Health Sciences	7	7	212
3	Business	4	4	112
4	Management	3	3	137
5	Education	1	1	11

Thomas Hoffmann

Publications

4.4K

Citations

H-Index

Page 1

	Year	Citations
A 90nm high volume manufacturing logic technology featuring novel 45nm gate length strained silicon CMOS transistors T. Ghani, M Armstrong, C. Auth, Silicon Cmos TransistorsEngineeringHigh VolumeSilicon On InsulatorSemiconductor Device	2004	559
A 90 nm logic technology featuring 50 nm strained silicon channel transistors, 7 layers of Cu interconnects, low k ILD, and 1 μm/sup 2/ SRAM cell Scott E. Thompson, N. Anand, M Armstrong, Nm Logic TechnologyEngineeringVlsi DesignEdge 90Computer Architecture	2003	241
Nanoimprint lithography: challenges and prospects S. Zankovych, Thomas Hoffmann, J. Seekamp, Nanotechnology EngineeringMechanical EngineeringBiomedical EngineeringBeam LithographyPrinted Electronics	2001	212
Assembly Line Balancing with a Precedence Matrix Thomas Hoffmann Management Science Mathematical ProgrammingLoad Balancing (Computing)Branch-and-bound AlgorithmEngineeringLine Balances	1963	190
Nanoimprint lithography: an alternative nanofabrication approach S. Zankovych, J. Seekamp, A. Kam, Materials Science and Engineering C Materials ScienceEngineeringNanoimprint LithographyBeam LithographyMicrofabrication	2003	176
Problems of the nanoimprinting technique for nanometer scale pattern definition Hella‐Christin Scheer, H. Schulz, Thomas Hoffmann Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringMicroscopyPattern TransferBiomedical EngineeringPolymer Nanocomposites	1998	163
Review of FINFET technology M. Jurczak, Nadine Collaert, A. Veloso, Low-power ElectronicsElectrical EngineeringEngineeringHigh-speed ElectronicsMicrofabrication	2009	162
Delaying forever: Uniaxial strained silicon transistors in a 90nm CMOS technology K. Mistry, M Armstrong, C. Auth, Electrical EngineeringEngineeringVlsi DesignNanoelectronicsSilicon Transistors	2004	153
Eureka: A Hybrid System for Assembly Line Balancing Thomas Hoffmann Management Science Mathematical ProgrammingLoad Balancing (Computing)Branch-and-bound AlgorithmEngineeringSalb Problems	1992	147
Benchmarking SOI and bulk FinFET alternatives for PLANAR CMOS scaling succession T. Chiarella, Liesbeth Witters, A. Mercha, Solid-State Electronics Electrical EngineeringPhysical Design (Electronics)EngineeringVlsi DesignTechnology Scaling	2010	120

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