Nanoimprint lithography: challenges and prospects

Abstract

We review the salient aspects of nanoimprint lithography and consider the challenges it faces in becoming a standard fabrication technique, such as costs and throughput. We discuss material issues such as visco-elasticity and functionality of the printed material. By way of an illustration, we present printing results of 50 nm features over a 2×2 cm2 area which are reproducible with high fidelity. Data of printing 15 nm features in PMMA using a Cr stamp was obtained.