Nanoimprint lithography: an alternative nanofabrication approach

S. Zankovych, J. Seekamp, A. Kam, +9

Materials Science and Engineering C

Materials ScienceEngineeringNanoimprint LithographyBeam LithographyMicrofabrication +7

Directly fabricated multi-scale microlens arrays on a hydrophobic flat surface by a simple ink-jet printing technique

Joo Yeon Kim, K. Pfeiffer, Anja Voigt, +2

Journal of Materials Chemistry

EngineeringResponsive PolymersShape-tunable ApproachBiomedical EngineeringMicro-optical Component +20

New polymer materials for nanoimprinting

H. Schulz, Hella‐Christin Scheer, Thomas Hoffmann, +8

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Materials ScienceThermoset PolymersPolymer ChemistryChemical EngineeringNew Aromatic Polymers +12

Master replication into thermosetting polymers for nanoimprinting

H. Schulz, D. Lyebyedyev, Hella‐Christin Scheer, +4

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringReplication QualityNanostructured PolymerBiomedical EngineeringPositive Replicas +16

New inks for the direct drop-on-demand fabrication of polymer lenses

Anja Voigt, Ute Ostrzinski, K. Pfeiffer, +4

Microelectronic Engineering

Materials SciencePolymer ChemistryEngineeringPolymer TechnologyMicrofabrication +8

Multistep profiles by mix and match of nanoimprint and UV lithography

K. Pfeiffer, Mathias Fink, G. Gruetzner, +3

Microelectronic Engineering

EngineeringElectron-beam LithographyBeam LithographyMicrofabricationNanotechnology +9

Polymer stamps for nanoimprinting

K. Pfeiffer, Mathias Fink, Gisela Ahrens, +11

Microelectronic Engineering

Materials ScienceEngineeringPolymer SciencePrinted ElectronicsNanostructured Polymer +5

<title>Nanoimprint lithography with a commercial 4-in. bond system for hot embossing</title>

Nils Roos, Thomas Luxbacher, T. Glinsner, +3

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyPattern TransferCommercial 4-InImprint Quality +21

Novel linear and crosslinking polymers for nanoimprinting with high etch resistance

K. Pfeiffer, Mathias Fink, G. Bleidießel, +6

Microelectronic Engineering

Materials SciencePolymer ChemistryEngineeringPolymer TechnologyHigh Etch Resistance +7

A comparison of thermally and photochemically cross-linked polymers for nanoimprinting

K. Pfeiffer, F. Reuther, Mathias Fink, +8

Microelectronic Engineering

Materials SciencePolymer ChemistryEngineeringNatural SciencesPolymer Science +6