Moshe E. Preil

Considerations for a free-electron laser-based extreme-ultraviolet lithography program

Erik R. Hosler, Obert R. Wood, William A. Barletta et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 26 citations

Accelerator Technology, Free-electron Lasers, Electrical Engineering +13

Fabrication of 28nm pitch Si fins with DSA lithography

Gerard M. Schmid, Richard A. Farrell, Ji Xu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 25 citations

Patterning Step, Pattern Formation, Wafer Scale Processing +15

Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology

Dhairya Dixit, Samuel O’Mullane, Sravan Sunkoju et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2015 · 23 citations · Full text

Mueller Matrix, Optical Materials, Engineering +20

Computational simulations and parametric studies for directed self-assembly process development and solution of the inverse directed self-assembly problem

Azat Latypov, Grant P. Garner, Moshe E. Preil et al. · Japanese Journal of Applied Physics · 2014 · 21 citations

Parametric Studies, Engineering, Molecular Self-assembly +24

Directed Self-Assembly Based Cut Mask Optimization for Unidirectional Design

Jiaojiao Ou, Bei Yu, Jhih-Rong Gao et al. · 2015 · 20 citations

Engineering, Geometry Generation, Computer-aided Design +17