M. Hori

Advanced channel engineering achieving aggressive reduction of V<inf>T</inf> variation for ultra-low-power applications

K. Fujita, Y. Torii, M. Hori et al. · 2011 · 57 citations

Angle-resolved XPS study on chemical bonds in ultrathin silicon oxynitride films

Seiji Shinagawa, Hiroshi Nohira, Tetsuya Ikuta et al. · Microelectronic Engineering · 2005 · 24 citations

Materials Science, Ii-vi Semiconductor, Chemical Bonds +10

A highly integrated 65-nm SoC process with enhanced power/performance of digital and analog circuits

Lawrence T. Clark, Daniel Zhao, Teymur Bakhishev et al. · 2012 · 22 citations

Engineering, Vlsi Design, Integrated Circuits +16

High performance 25 nm gate CMOSFETs for 65 nm node high speed MPUs

Kenichi Gotō, Y. Tagawa, Hiromichi Ohta et al. · 2004 · 22 citations

Low-power Electronics, Electrical Engineering, Engineering +13

Angle-resolved photoelectron spectroscopy on gate insulators

Takanori Hattori, Hiroshi Nohira, Seiji Shinagawa et al. · Microelectronics Reliability · 2006 · 12 citations

Engineering, Gate Insulators, Applied Physics +2