GaAs cleaning with a hydrogen radical beam gun in an ultrahigh-vacuum system

Sumio Sugata, A. Takamori, N. Takado, +3

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

Materials ScienceSemiconductorsElectrical EngineeringSemiconductor TechnologyEngineering +13

Reactive ion beam etching of Y-Ba-Cu-O superconductors

S. Matsui, N. Takado, H. Tsuge, +1

Applied Physics Letters

Materials ScienceSuperconducting MaterialElectrical EngineeringHigh-tc SuperconductivityEngineering +10

Vertical to surface transmission electrophotonic device with selectable output light channels

Y. Tashiro, N. Hamao, M. Sugimoto, +4

Applied Physics Letters

EngineeringOptical Transmission SystemTransmission Electrophotonic DeviceProgrammable PhotonicsOptical Computing +14

Chemically enhanced focused ion beam etching of deep grooves and laser-mirror facets in GaAs under Cl2 gas irradiation using a fine nozzle

N. Takado, K. Asakawa, T. Yuasa, +4

Applied Physics Letters

Optical MaterialsEngineeringElectron-beam LithographyLaser ApplicationsFine Nozzle +17

Chlorine-Based Smooth Reactive Ion Beam Etching of Indium-Containing III-V Compound Semiconductor

Takashi Yoshikawa, Sigeru Kohmoto, Masami Anan, +6

Japanese Journal of Applied Physics

Materials ScienceElectrical EngineeringLow Cl 2EngineeringIon Implantation +12

Focused ion beam processes for high-<i>T</i> <i>c</i> superconductors

S. Matsui, Y. Ochiai, Yoshikatsu Kojima, +7

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

Materials ScienceIon ImplantationTc ControlEngineeringPhysics +12

An AlGaAs laser with high-quality dry etched mirrors fabricated using an ultrahigh vacuum in situ dry etching and deposition processing system

M. Uchida, S. Ishikawa, N. Takado, +1

IEEE Journal of Quantum Electronics

Laser Processing (Laser Material Processing)Optical MaterialsEngineeringUltrahigh VacuumLaser Applications +20

<i>In</i> <i>situ</i> electron beam patterning for GaAs using electron-cyclotron-resonance plasma-formed oxide mask and Cl2 gas etching

S. Kohmoto, N. Takado, Yoshimasa Sugimoto, +3

Applied Physics Letters

Oxide MaskCl2 Gas EtchingElectrical EngineeringSitu Fabrication ProcessEngineering +12

Surface-emitting GaAs/AlGaAs lasers with dry-etched 45° total reflection mirrors

N. Hamao, M. Sugimoto, N. Takado, +4

Applied Physics Letters

PhotonicsOptical MaterialsEngineeringSemiconductor LasersOptical Properties +11

Very Low Threshold AlGaAs/GaAs Quantum Well Lasers Fabricated by Self-Aligned Impurity Induced Disordering

Mitsunori Sugimoto, Noboru Hamano, N. Takado, +2

Japanese Journal of Applied Physics

PhotonicsElectrical EngineeringEngineeringPhysicsSemiconductor Lasers +9