C. Weintraub

22nm FDSOI technology for emerging mobile, Internet-of-Things, and RF applications

R. Carter, J. Mazurier, Luca Pirro et al. · 2016 · 283 citations · Full text

Engineering, Vlsi Design, Radio Frequency +16

Observation of latent reliability degradation in ultrathin oxides after heavy-ion irradiation

John S. Suehle, Eric M. Vogel, P. Roitman et al. · Applied Physics Letters · 2002 · 49 citations

Materials Science, Ultrathin Oxides, Electrical Engineering +15

Study of low-frequency charge pumping on thin stacked dielectrics

C. Weintraub, Eric M. Vogel, John R. Hauser et al. · IEEE Transactions on Electron Devices · 2001 · 29 citations

Electrical Engineering, Energy Harvesting, Dielectrics +15

Low-variation SRAM bitcells in 22nm FDSOI technology

Vivek Joshi, Hema Ramamurthy, Sriram Balasubramanian et al. · 2017 · 14 citations

Sram Bitcell, Electrical Engineering, Engineering +10

Characterization and production metrology of gate dielectric films

Alain C. Diebold, Jesse D. Canterbury, Will Chism et al. · Materials Science in Semiconductor Processing · 2001 · 12 citations

Electrical Engineering, Production Metrology, Engineering +7