Antoinette F. Molless

Optimum mask and source patterns to print a given shape

Alan E. Rosenbluth, S. Bukofsky, M. Hibbs et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 112 citations

Architecture, Design, Design Optimization +13

Level-specific lithography optimization for 1-Gb DRAM

Alfred K. K. Wong, Richard A. Ferguson, Scott Mansfield et al. · IEEE Transactions on Semiconductor Manufacturing · 2000 · 109 citations

Engineering, Computer Engineering, Design Optimization +15

Lithographic effects of mask critical dimension error

Alfred K. K. Wong, Richard A. Ferguson, Lars W. Liebmann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1998 · 34 citations

Engineering, Physics, Contrast Sensitivity +9

Lithographic comparison of assist feature design strategies

Scott Mansfield, Lars W. Liebmann, Antoinette F. Molless et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 28 citations

Engineering, Design, Manufacturing Engineering +11

Understanding across-chip line-width variation: the first step toward optical proximity correction

Lars W. Liebmann, Antoinette F. Molless, Richard A. Ferguson et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1997 · 17 citations

Engineering, Electrical Engineering, Microfabrication +16