R. Kavari

Microstructure and reliability of copper interconnects

Changsup Ryu, Kee-Won Kwon, Alvin L. S. Loke et al. · IEEE Transactions on Electron Devices · 1999 · 187 citations

Natural Sciences, Electrical Engineering, Materials Science +16

Demonstration of scaled (⩾0.12 μm2) Pb(Zr,Ti)O3 capacitors on W plugs with Al interconnect

Scott R. Summerfelt, T. S. Moise, Guoqiang Xing et al. · Applied Physics Letters · 2001 · 39 citations

Engineering, Materials Engineering, Materials Science +17

Hydrogen-Robust Submicron IrO_x/Pb(Zr, Ti)O₃/Ir Capacitors for Embedded Ferroelectric Memory

Tomoyuki Sakoda, T. S. Moise, Scott R. Summerfelt et al. · Japanese Journal of Applied Physics · 2001 · 31 citations

Engineering, Materials Engineering, Materials Science +17

Electromigration of submicron Damascene copper interconnects

Changsup Ryu, Kee-Won Kwon, Alvin L. S. Loke et al. · 2002 · 22 citations

Engineering, Electrical Engineering, Materials Engineering +17