J. N. Sasserath

Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures

Meint J. de Boer, Henri Jansen, Edwin Smulders et al. · Journal of Microelectromechanical Systems · 2002 · 264 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Low Temperature Silicon Nitride and Silicon Dioxide Film Processing by Inductively Coupled Plasma Chemical Vapor Deposition

J. W. Lee, Kenneth D. Mackenzie, D. J. Johnson et al. · Journal of The Electrochemical Society · 2000 · 62 citations

Natural Sciences, Materials Engineering, Materials Science +16

Advanced selective dry etching of GaAs/AlGaAs in high density inductively coupled plasmas

J. W. Lee, M. Devre, B. H. Reelfs et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2000 · 50 citations

Engineering, Electrical Engineering, Materials Science +17

Magnetically enhanced etching of sub-0.5 μm polysilicon gates

S. Bui, J. N. Sasserath, Ebrahim Ghanbari · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 21 citations

Engineering, Materials Engineering, Materials Science +17

Magnetron reactive ion etching of GaAs in SiCl4

M. Meyyappan, G. F. McLane, H. S. Lee et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1992 · 17 citations

Engineering, Electrical Engineering, Materials Science +17