8
Publications
375
Citations
8
H-Index
2010
Active since
Torsten Harzendorf is an author at Fraunhofer Institute for Applied Optics and Precision Engineering specializing in engineering, applied physics, and optoelectronics.
Top concepts
EngineeringApplied PhysicsMicroscopyOptoelectronicsMicrofabricationPhotonics3D PrintingOptical SystemsMaterial ScienceGratings
Publications per year
2010–2019
8
8
High performance diffraction gratings made by e-beam lithography
Uwe D. Zeitner, Maria Oliva, F. Fuchs et al. · Applied Physics A · 2012 · 100 citations
Advanced mask aligner lithography: new illumination system
Reinhard Voelkel, Uwe Vogler, A. Bich et al. · Optics Express · 2010 · 90 citations · Full text
Proximity Lithography, Engineering, New Illumination System +11
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