A. V. Rakov

Linear Standard for SEM–AFM Microelectronics Dimensional Metrology in the Range 0.01–100 μm

Ch. P. Volk, E. S. Gornev, Yu. A. Novikov et al. · Russian Microelectronics · 2002 · 53 citations

Engineering, Electrical Engineering, Materials Science +16

Measurement of the parameters of the electron beam of a scanning electron microscope

Yu. A. Novikov, A. V. Rakov · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 38 citations

Natural Sciences, Physics, Instrumentation +14

SEM Linear Measurement in a Wide Magnification Range

Ch. P. Volk, E. S. Gornev, Yu. A. Novikov et al. · Russian Microelectronics · 2004 · 32 citations

Engineering, Manufacturing Engineering, Instrumentation +4

SEM linewidth measurements of anisotropically etched silicon structures smaller than 0.1 µm

C. G. Frase, Wolfgang Häßler‐Grohne, Gaoliang Dai et al. · Measurement Science and Technology · 2007 · 31 citations

Natural Sciences, Materials Engineering, Materials Science +17

Measurement of dimensions of resist mask elements below 100 nm with help of a scanning electron microscope

V. A. Kal’nov, Yu. A. Novikov, A. A. Orlikovsky et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 31 citations

Natural Sciences, Materials Science, Materials Characterization +13