Takashi Imaoka

Dependence of thin-oxide films quality on surface microroughness

T. Ohmi, M. Miyashita, M. Itano et al. · IEEE Transactions on Electron Devices · 1992 · 300 citations

Materials Science, Electrical Engineering, Engineering +13

Metallic Impurities Segregation at the Interface Between Si Wafer and Liquid during Wet Cleaning

T. Ohmi, Takashi Imaoka, Ichiko Sugiyama et al. · Journal of The Electrochemical Society · 1992 · 89 citations

Engineering, Metallic Impurities Segregation, Integrated Circuits +17

Native Oxide Growth and Organic Impurity Removal on Si Surface with Ozone‐Injected Ultrapure Water

T. Ohmi, T. Isagawa, Masahiko Kogure et al. · Journal of The Electrochemical Society · 1993 · 59 citations

Engineering, Chemical Composition, Ulsi Devices +19

Segregation and Removal of Metallic Impurity at Interface of Silicon and Fluorine Etchant

Tadahiro Ohmi, Takashi Imaoka, Takehiko Kezuka et al. · Journal of The Electrochemical Society · 1993 · 55 citations

Engineering, Metallic Impurity, Fluorine Etchant +24

Dependence of Thin Oxide Films Quality on Surface Micro-Roughness

M. Miyashita, M. Itano, Takashi Imaoka et al. · 1991 · 43 citations

Engineering, Surface Micro-roughness, Ulsi Devices +16