5
Publications
124
Citations
5
H-Index
2002
Active since
Thomas Klimpel is an author at Synopsys (United States) specializing in engineering, applied physics, and microelectronics.
Top concepts
EngineeringApplied PhysicsMicroscopyMicroelectronicsElectrical InsulationElectrical EngineeringPhysicsMedicineDosimetryRadiology
Publications per year
2002–2019
5
5
Charge-induced pattern displacement in E-beam lithography
Kerim T. Arat, Thomas Klimpel, A.C. Zonnevylle et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2019 · 22 citations · Full text
Engineering, Electron-beam Lithography, Electron Diffraction +18
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1–5 of 5