W.S. Lindenberger is an author at AT&T (United States) specializing in engineering, applied physics, and electrical engineering.
Top concepts
EngineeringApplied PhysicsMicroelectronicsElectrical EngineeringMaterial ScienceThin FilmsSemiconductorsCmos TechnologyNanoelectronicsSurface Science
Publications per year
1970–2003
7
7
Fluorine effect on boron diffusion of p/sup +/ gate devices (MOSFETs)
J.M. Sung, C.-Y. Lu, M.L. Chen et al. · 2003 · 28 citations
Semiconductors, Semiconductor Technology, Electrical Engineering +15
Ultra-fast (0.5- mu m) CMOS circuits in fully depleted SOI films
Avid Kamgar, S.J. Hillenius, H.-I. Cong et al. · IEEE Transactions on Electron Devices · 1992 · 27 citations
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1–5 of 7