Concepedia

D. B. Fraser

DB

14

Publications

928

Citations

13

H-Index

1978

Active since

Affiliations

Nokia (United States)(Current)

D. B. Fraser is an author at Nokia (United States) specializing in applied physics, engineering, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceSurface ScienceThin FilmsMicroelectronicsCrystalline DefectsElectrical EngineeringMaterials EngineeringMicrostructure

Publications per year

1978–1987

14

Publications

14

Thin film interaction between titanium and polycrystalline silicon

S. P. Murarka, D. B. Fraser · Journal of Applied Physics · 1980 · 190 citations

Materials Science, Materials Engineering, Engineering +15

Silicide formation in thin cosputtered (titanium + silicon) films on polycrystalline silicon and SiO2.

S. P. Murarka, D. B. Fraser · Journal of Applied Physics · 1980 · 131 citations

Materials Science, Materials Engineering, Solid Solubility +15

Resistivities of Thin Film Transition Metal Silicides

S. P. Murarka, M. H. Read, C. J. Doherty et al. · Journal of The Electrochemical Society · 1982 · 119 citations

Materials Science, Sheet Resistance, Engineering +14

Refractory silicides of titanium and tantalum for low-resistivity gates and interconnects

S. P. Murarka, D. B. Fraser, A. K. Sinha et al. · IEEE Transactions on Electron Devices · 1980 · 104 citations

Materials Science, Electrical Engineering, Engineering +12

Oxidation of tantalum disilicide on polycrystalline silicon

S. P. Murarka, D. B. Fraser, W.S. Lindenberger et al. · Journal of Applied Physics · 1980 · 57 citations

Materials Engineering, Tantalum Disilicide, Materials Science +9

Rows per page

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