Jeroen Meessen

Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Mircea Dusa, John Quaedackers, Olaf F. A. Larsen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 89 citations

Engineering, Manufacturing Engineering, Manufacturing Processes +13

Evaluation of EUV resist performance below 20nm CD using helium ion lithography

Diederik Maas, Emile van Veldhoven, Anja van Langen–Suurling et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 14 citations · Full text

Engineering, Electrical Engineering, Materials Science +13

Nano-engineering with a focused helium ion beam

Diederik Maas, Emile W. van der Drift, Emile van Veldhoven et al. · MRS Proceedings · 2011 · 11 citations

Natural Sciences, Nuclear Engineering, Physics +8

CD bias reduction in CD-SEM linewidth measurements for advanced lithography

Maki Tanaka, Jeroen Meessen, Chie Shishido et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 10 citations

Engineering, Materials Engineering, Materials Science +17