Concepedia
Statistics
Publications
29
Citations
1.1K
H-Index
19
Active since
1995
Affiliations
Intel (United States)(Current)
University at Albany, State University of New York
Stanford University
University of Michigan
Pennsylvania State University
Jeff Bielefeld is an author at Intel (United States) specializing in engineering, applied physics, and materials science.
Top concepts
EngineeringApplied PhysicsMaterial ScienceThin FilmsNanoelectronicsMaterials EngineeringElectrical EngineeringElectrical InsulationPhysicsMicroelectronics
Publications per year
1995–2019
A 90 nm logic technology featuring 50 nm strained silicon channel transistors, 7 layers of Cu interconnects, low k ILD, and 1 μm/sup 2/ SRAM cell
Scott E. Thompson, N. Anand, M Armstrong et al. · 2003 · 241 citations
Nm Logic Technology, Engineering, Vlsi Design +19
Fourier transform infrared spectroscopy investigation of chemical bonding in low-k a-SiC:H thin films
Sean W. King, Marc French, Jeff Bielefeld et al. · Journal of Non-Crystalline Solids · 2011 · 102 citations
Materials Science, Fourier Transform, Engineering +9
Influence of network bond percolation on the thermal, mechanical, electrical and optical properties of high and low-k a-SiC:H thin films
Sean W. King, Jeff Bielefeld, Guanghai Xu et al. · Journal of Non-Crystalline Solids · 2013 · 83 citations
Materials Science, Electrical Engineering, Engineering +8
Film Property Requirements for Hermetic Low-k a-SiO<sub>x</sub>C<sub>y</sub>N<sub>z</sub>:H Dielectric Barriers
Sean W. King, Danya Jacob, D. Vanleuven et al. · ECS Journal of Solid State Science and Technology · 2012 · 59 citations
Engineering, Nanoporous Material, Critical Thresholds +18
Mass and bond density measurements for PECVD a-SiCx:H thin films using Fourier transform-infrared spectroscopy
Sean W. King, Jeff Bielefeld, Marc French et al. · Journal of Non-Crystalline Solids · 2011 · 54 citations
Materials Science, Engineering, Pecvd A-sicx +8
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