Concepedia

Danya Jacob

DJ

Statistics

Publications

3

Citations

82

H-Index

3

Active since

2012

Affiliations

Intel (United States)(Current)

University at Albany, State University of New York

University of Missouri–Kansas City

Danya Jacob is an author at Intel (United States) specializing in applied physics, engineering, and thin films.

Top concepts

Publications per year

2012–2017

3

Publications

3

Film Property Requirements for Hermetic Low-k a-SiO<sub>x</sub>C<sub>y</sub>N<sub>z</sub>:H Dielectric Barriers

Sean W. King, Danya Jacob, D. Vanleuven et al. · ECS Journal of Solid State Science and Technology · 2012 · 59 citations

, , +18

Combinatorial survey of fluorinated plasma etching in the silicon-oxygen-carbon-nitrogen-hydrogen system

Shailesh Dhungana, Bradley J. Nordell, Anthony N. Caruso et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 12 citations

, , +21

Boron and high-<i>k</i> dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing

Shailesh Dhungana, Thuong D. Nguyen, Bradley J. Nordell et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2017 · 11 citations · Full text

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