Concepedia

Shailesh Dhungana

SD

Statistics

Publications

3

Citations

42

H-Index

3

Active since

2016

Affiliations

Intel (United States)(Current)

University at Albany, State University of New York

University of Missouri–Kansas City

Shailesh Dhungana is an author at Intel (United States) specializing in applied physics, electrical engineering, and thin films.

ORCID

Top concepts

Publications per year

2016–2017

3

Publications

3

Conquering the Low‐<i>k</i> Death Curve: Insulating Boron Carbide Dielectrics with Superior Mechanical Properties

Bradley J. Nordell, Thuong D. Nguyen, Christopher L. Keck et al. · Advanced Electronic Materials · 2016 · 19 citations

, , +17

Combinatorial survey of fluorinated plasma etching in the silicon-oxygen-carbon-nitrogen-hydrogen system

Shailesh Dhungana, Bradley J. Nordell, Anthony N. Caruso et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 12 citations

, , +21

Boron and high-<i>k</i> dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing

Shailesh Dhungana, Thuong D. Nguyen, Bradley J. Nordell et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2017 · 11 citations · Full text

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