Concepedia

M. Shinosky

MS

Statistics

Publications

16

Citations

429

H-Index

14

Active since

2005

Affiliations

IBM (United States)(Current)

IBM Research - Thomas J. Watson Research Center

Essex Westford School District

Advanced Micro Devices (Canada)

M. Shinosky is an author at IBM (United States) specializing in electrical engineering, engineering, and microelectronics.

Top concepts

EngineeringElectrical EngineeringMicroelectronicsElectronic PackagingElectrical InsulationApplied PhysicsComputer EngineeringNanoelectronicsMaterial ScienceMaterials Engineering

Publications per year

2005–2016

16

Publications

16

Cu/low-k dielectric TDDB reliability issues for advanced CMOS technologies

F. Chen, D. Harmon, M. Shinosky et al. · Microelectronics Reliability · 2008 · 48 citations

Electrical Engineering, Engineering, Hardware Reliability +7

Line edge roughness and spacing effect on low-k TDDB characteristics

F. Chen, J. R. Lloyd, Kaushik Chanda et al. · 2008 · 46 citations

Electrical Engineering, Engineering, Hardware Reliability +9

Investigation of CVD SiCOH low-k time-dependent dielectric breakdown at 65nm node technology

F. Chen, Kaushik Chanda, Inderbir S. Gill et al. · 2005 · 42 citations

Materials Science, Tddb Degradation, Electrical Engineering +14

The Effect of Metal Area and Line Spacing on TDDB Characteristics of 45nm Low-k SiCOH Dielectrics

F. Chen, P. McLaughlin, J. Gambino et al. · 2007 · 40 citations

Engineering, Line Spacing, Low-k Sicoh Dielectrics +18

Electron fluence driven, Cu catalyzed, interface breakdown mechanism for BEOL low-k time dependent dielectric breakdown

Fen Chen, M. Shinosky · Microelectronics Reliability · 2014 · 33 citations

Materials Science, Electrical Engineering, Electromigration Technique +8

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