Takashi Koida - Concepedia

Author

Takashi Koida

National Institute of Advanced Industrial Science and Technology ORCID

Also Known As

Koida, T., Kondo, M., T Koida, T. Koida, Takashi KOIDA, Takashi Koida, Takashi Koidal

136

Publications

5.4K

Citations

H-Index

Concepts

All Affiliations

National Institute of Advanced Industrial Science and Technology Tokyo Institute of Technology Japan Science and Technology Agency Tohoku University Photonics Electronics Technology Research Association

About

Takashi Koida is an author at National Institute of Advanced Industrial Science and Technology specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	33	53	4.8K
2	Applied Physics	33	53	4.8K
3	Electrical Engineering	20	26	1.4K
4	Chemistry	5	5	540
5	Chemical Engineering	2	2	96

Takashi Koida

Publications

5.1K

Citations

H-Index

Page 1

	Year	Citations
Mg x Zn 1−x O as a II–VI widegap semiconductor alloy Akira Ohtomo, M. Kawasaki, Takashi Koida, Applied Physics Letters Materials ScienceMaterials EngineeringIi-vi SemiconductorEngineeringMgxzn1−xo Films	1998	1.5K
Hydrogen-doped In<sub>2</sub>O<sub>3</sub> as High-mobility Transparent Conductive Oxide Takashi Koida, Hiroyuki Fujiwara, Michio Kondo Japanese Journal of Applied Physics Optical MaterialsEngineeringThin Film Process TechnologyChemistryEpitaxial Growth	2007	241
Correlation between the photoluminescence lifetime and defect density in bulk and epitaxial ZnO Takashi Koida, Shigefusa F. Chichibu, Akira Uedono, Applied Physics Letters Photoluminescence LifetimePoint DefectsEngineeringLuminescence PropertyNonradiative Pl Lifetime	2003	241
Ferromagnetism in Co-Doped TiO<sub>2</sub> Rutile Thin Films Grown by Laser Molecular Beam Epitaxy Yuji Matsumoto, Ryota Takahashi, Makoto Murakami, Japanese Journal of Applied Physics Materials ScienceOxide HeterostructuresMultiferroicsOptical MaterialsEngineering	2001	188
Rapid construction of a phase diagram of doped Mott insulators with a composition-spread approach Tomoteru Fukumura, Makoto Ohtani, M. Kawasaki, Applied Physics Letters Materials ScienceDoped Mott InsulatorsSemiconductor TechnologyEngineeringPhysics	2000	169
High-mobility hydrogen-doped In2O3In2O3 transparent conductive oxide for a-Si:H/c-Si heterojunction solar cells Takashi Koida, Hiroyuki Fujiwara, Michio Kondo Solar Energy Materials and Solar Cells Electrical EngineeringEngineeringOrganic Solar CellApplied PhysicsSemiconductor Material	2008	141
Hydrogen-doped In2O3 transparent conducting oxide films prepared by solid-phase crystallization method Takashi Koida, Michio Kondo, K. Tsutsumi, Journal of Applied Physics EngineeringSolid-state ChemistryCrystallized FilmsSemiconductorsThin Film Processing	2010	134
High-efficiency amorphous silicon solar cells: Impact of deposition rate on metastability Takuya Matsui, Adrien Bidiville, Keigou Maejima, Applied Physics Letters EngineeringPhotovoltaic DevicesOptoelectronic DevicesChemistryPhotovoltaic System	2015	132
A passivating contact for silicon solar cells formed during a single firing thermal annealing Andrea Ingenito, Gizem Nogay, Quentin Jeangros, Nature Energy SemiconductorsElectrical EngineeringEngineeringPassivating ContactApplied Physics	2018	130
Triple-junction thin-film silicon solar cell fabricated on periodically textured substrate with a stabilized efficiency of 13.6% Hitoshi Sai, Takuya Matsui, Takashi Koida, Applied Physics Letters EngineeringOrganic Solar CellH Triple-junction CellsPhotovoltaic DevicesIntegrated Circuits	2015	119

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