Japanese Journal of Applied Physics · 2007 · 244 citations · 10 references
Natural SciencesMaterials SciencePhysicsElectronic MaterialsSemiconductor MaterialsThin FilmsAmorphous SemiconductorsDopingGlass MaterialsOxide SemiconductorsThin-film MaterialsTransparent Conducting OxidesAnnealingCharge Carrier DensityDoping In Thin FilmsGrain Boundary DefectsImpuritiesPost-deposition AnnealingThin-film OxidesTransparent Conductive Oxides
We have developed hydrogen (H)-doped In2O3 films on glass with high mobility and high near-infrared transparency by using sputtering process performed at room temperature, followed by post-annealing treatment at 200 °C. To incorporate H-donor into In2O3 matrix, H2O vapor has been introduced into a chamber during the deposition. In the post-annealing of the films, phase transition from amorphous to polycrytalline was confirmed to occur. The resulting In2O3 films containing 1.9–6.3 at. % H show quite large mobility as high as 98–130 cm2/(V s) at carrier density of (1.4–1.8)×1020 cm-3. We attributed the high mobility in the film to suppression of grain boundary defects as well as multicharged and neutral impurities.
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Hydrogen as a Cause of Doping in Zinc Oxide
Chris G. Van de Walle · Physical Review Letters · 2000 · 2.2K citations · Full text
Anderson Janotti, Chris G. Van de Walle · Nature Materials · 2006 · 728 citations
A new transparent conductive thin film In2O3:Mo
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Natural Sciences, Materials Engineering, Materials Science +10
S. Ishibashi, Yoshiyuki Higuchi, Yukihide Ota et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1990 · 166 citations
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