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Hydrogen-doped In<sub>2</sub>O<sub>3</sub> as High-mobility Transparent Conductive Oxide
241
Citations
10
References
2007
Year
Optical MaterialsEngineeringThin Film Process TechnologyChemistryEpitaxial GrowthThin Film ProcessingOxide HeterostructuresMaterials ScienceCrystalline DefectsOxide ElectronicsHigh MobilityHydrogenIn2o3 MatrixIn2o3 FilmsSurface ScienceApplied PhysicsThin FilmsFunctional MaterialsChemical Vapor Deposition
We have developed hydrogen (H)-doped In2O3 films on glass with high mobility and high near-infrared transparency by using sputtering process performed at room temperature, followed by post-annealing treatment at 200 °C. To incorporate H-donor into In2O3 matrix, H2O vapor has been introduced into a chamber during the deposition. In the post-annealing of the films, phase transition from amorphous to polycrytalline was confirmed to occur. The resulting In2O3 films containing 1.9–6.3 at. % H show quite large mobility as high as 98–130 cm2/(V s) at carrier density of (1.4–1.8)×1020 cm-3. We attributed the high mobility in the film to suppression of grain boundary defects as well as multicharged and neutral impurities.
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