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Correlation between the photoluminescence lifetime and defect density in bulk and epitaxial ZnO
241
Citations
19
References
2003
Year
Photoluminescence LifetimePoint DefectsEngineeringLuminescence PropertyNonradiative Pl LifetimeIi-vi SemiconductorOptical PropertiesMolecular Beam EpitaxyEpitaxial GrowthCompound SemiconductorMaterials SciencePhotoluminescencePhysicsOxide ElectronicsDefect DensitySingle Point DefectsApplied PhysicsOptoelectronicsEpitaxial Zno
Influences of point defects on the nonradiative processes in ZnO were studied using steady-state and time-resolved photoluminescence (PL) spectroscopy making a connection with the results of positron annihilation measurement. Free excitonic PL intensity naturally increased with the increase in the nonradiative PL lifetime (τnr). Density or size of Zn vacancies (VZn) decreased and τnr increased with increasing growth temperature in heteroepitaxial films grown on a ScAlMgO4 substrate. Use of homoepitaxial substrate further decreased the VZn density. However, τnr was the shortest for the homoepitaxial film; i.e., no clear dependence was found between τnr and density / size of VZn or positron scattering centers. The results indicated that nonradiative recombination processes are not solely governed by single point defects, but by certain defect species introduced by the presence of VZn such as vacancy complexes.
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