Publication | Open Access
Mg x Zn 1−x O as a II–VI widegap semiconductor alloy
1.5K
Citations
12
References
1998
Year
Materials ScienceMaterials EngineeringIi-vi SemiconductorEngineeringMgxzn1−xo FilmsOxide ElectronicsApplied PhysicsMgo Impurity PhaseAlloy DesignThin FilmsAlloy PhaseEpitaxial GrowthMolecular Beam EpitaxyOptoelectronicsBand Gap
We propose a widegap II–VI semiconductor alloy, MgxZn1−xO, for the fabrication of heteroepitaxial ultraviolet light emitting devices based on ZnO. The c-axis oriented MgxZn1−xO films were epitaxially grown by pulsed laser deposition on ZnO epitaxial films and sapphire (0001) substrates using ceramic targets. Solid solution films were prepared with Mg content up to x=0.33, achieving a band gap of 3.99 eV at room temperature. MgO impurity phase segregated at x⩾0.36. Lattice constants of MgxZn1−xO films changed slightly (∼1%), increasing in a axis and decreasing in c-axis direction with increasing x. These films showed ultraviolet photoluminescence at energies from 3.36 (x=0) to 3.87 eV (x=0.33) at 4.2 K.
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