Rafaiel A. Ovanesyan

Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook

Rafaiel A. Ovanesyan, Ekaterina A. Filatova, Simon D. Elliott et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2019 · 121 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Low-Temperature Conformal Atomic Layer Deposition of SiN_<i>x</i> Films Using Si₂Cl₆ and NH₃ Plasma

Rafaiel A. Ovanesyan, Dennis M. Hausmann, Sumit Agarwal · ACS Applied Materials & Interfaces · 2015 · 82 citations

Natural Sciences, Materials Engineering, Materials Science +17

Atomic Layer Deposition of SiC_<i>x</i>N_<i>y</i> Using Si₂Cl₆ and CH₃NH₂ Plasma

Rafaiel A. Ovanesyan, Noémi Leick, Kathryn M. Kelchner et al. · Chemistry of Materials · 2017 · 28 citations

Natural Sciences, Materials Engineering, Materials Science +17

A Three-Step Atomic Layer Deposition Process for SiN_<i>x</i> Using Si₂Cl₆, CH₃NH₂, and N₂ Plasma

Rafaiel A. Ovanesyan, Dennis M. Hausmann, Sumit Agarwal · ACS Applied Materials & Interfaces · 2018 · 28 citations

Natural Sciences, Materials Engineering, Materials Science +17

Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics

Rafaiel A. Ovanesyan, Dennis M. Hausmann, Sumit Agarwal · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2017 · 19 citations

Natural Sciences, Materials Engineering, Materials Science +17