Concepedia
Statistics
Publications
4
Citations
43
H-Index
Active since
2001
Affiliations
Photronics (United States)(Current)
MIT Lincoln Laboratory
K Lab (United States)
Peter D. Rhyins is an author at Photronics (United States) specializing in mask fabrication, engineering, and mask design.
Publications per year
2001–2003
Fabrication of Step and Flash imprint lithography templates using commercial mask processes
Ecron Thompson, Peter D. Rhyins, Ronald D. Voisin et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 11 citations
Engineering, Manufacturing Engineering, Biomems +9
100-nm node lithography with KrF?
M. Fritze, Brian Tyrrell, David K. Astolfi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 11 citations
Engineering, Electrical Engineering, Nanotechnology +10
Gratings of regular arrays and trim exposures for ultralarge scale integrated circuit phase-shift lithography
M. Fritze, Brian Tyrrell, David K. Astolfi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 11 citations
Engineering, Electrical Engineering, Microfabrication +14
Dense only phase-shift template lithography
M. Fritze, Brian Tyrrell, Renee D. Mallen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 10 citations
Engineering, Electrical Engineering, Manufacturing Engineering +13
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