Richard van Haren

Wafer-shape based in-plane distortion predictions using Superfast 4G metrology

Leon van Dijk, Jeffrey Mileham, Ilja Malakhovsky et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 29 citations

Engineering, Manufacturing Engineering, Microelectronics +12

Pattern recognition and data mining techniques to identify factors in wafer processing and control determining overlay error

Auguste Lam, Alexander Ypma, Maxime Gatefait et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 13 citations

Engineering, Manufacturing Engineering, Manufacturing Systems +14

Toward 7nm target on product overlay for C028 FDSOI technology

Maxime Gatefait, Bertrand Le-Gratiet, P.-J. Goirand et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 11 citations

Engineering, Manufacturing Engineering, Computer Architecture +16

Segmented alignment mark optimization and signal strength enhancement for deep trench process

Yuanting Cui, Frank Goodwin, Richard van Haren · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 11 citations

Engineering, Manufacturing Engineering, Microfabrication +12

Towards Big Data Visualization for Monitoring and Diagnostics of High Volume Semiconductor Manufacturing

Dimitra Gkorou, Alexander Ypma, George Tsirogiannis et al. · 2017 · 11 citations

Computing, Computer Science, Manufacturing Engineering +17