Hiromasa Yamanashi

Contamination removal from EUV multilayer using atomic hydrogen generated by heated catalyzer

Hiroaki Oizumi, Hiromasa Yamanashi, Iwao Nishiyama et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 32 citations

Contamination Removal, Engineering, Chemistry +20

Study of Measurement Condition Optimization in Critical Dimension-Scanning Electron Microscope

Keiichiro Hitomi, Yoshinori Nakayama, Hiromasa Yamanashi et al. · Japanese Journal of Applied Physics · 2008 · 18 citations

Engineering, Electron-beam Lithography, Microscopy +18

Resist pattern fluctuation limits in extreme-ultraviolet lithography

E.W. Scheckler, Taro Ogawa, Hiromasa Yamanashi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 13 citations

Engineering, Electron-beam Lithography, Extreme-ultraviolet Lithography +17

Performance and quality analysis of Mo–Si multilayers formed by ion-beam and magnetron sputtering for extreme ultraviolet lithography

Kenji Hiruma, Shinji Miyagaki, Hiromasa Yamanashi et al. · Thin Solid Films · 2007 · 13 citations

Materials Science, Extreme Ultraviolet Lithography, Mo–si Multilayers +11

Influence of glass substrate surface roughness on extreme ultraviolet reflectivity of Mo∕Si multilayer

Shinji Miyagaki, Hiromasa Yamanashi, Atsuko Yamaguchi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 11 citations

Materials Science, Surface Characterization, Engineering +13