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Performance and quality analysis of Mo–Si multilayers formed by ion-beam and magnetron sputtering for extreme ultraviolet lithography

Materials ScienceExtreme Ultraviolet LithographyMo–si MultilayersEngineeringElectron-beam LithographyBeam LithographySurface ScienceApplied PhysicsMagnetron SputteringSemiconductor Device FabricationIntegrated CircuitsThin FilmsSilicon On InsulatorNanolithography Method