Md. Iqbal Bahar Chowdhury

A cost effective 32nm high-K/ metal gate CMOS technology for low power applications with single-metal/gate-first process

X. Chen, S. Samavedam, Vijay Narayanan et al. · 2008 · 113 citations

Engineering, Computer Engineering, Electrical Engineering +16

A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applications

Siddarth Krishnan, U. Kwon, N. Moumen et al. · 2011 · 81 citations

Engineering, Computer Engineering, Electrical Engineering +17

High performance 32nm SOI CMOS with high-k/metal gate and 0.149µm 2 SRAM and ultra low-k back end with eleven levels of copper

B. Greene, Qingqing Liang, K. Amarnath et al. · Symposium on VLSI Technology · 2006 · 40 citations

Engineering, Computer Engineering, Electrical Engineering +15

TCAD based performance analysis of junctionless cylindrical double gate all around FET up to 5nm technology node

Nazir Hossain, Sakib Quader, Abu Bakar Siddik et al. · 2017 · 21 citations

Engineering, Electrical Engineering, Electronic Materials +12

Design and Analysis of a High-Gain, Low-Noise, and Low-Power Analog Front End for Electrocardiogram Acquisition in 45 nm Technology Using gm/ID Method

Md. Zubair Alam Emon, Khosru M Salim, Md. Iqbal Bahar Chowdhury · Electronics · 2024 · 18 citations · Full text

Engineering, Biomedical Engineering, Electrical Engineering +17