Chad M. Huard

Plasma etching of high aspect ratio features in SiO2 using Ar/C4F8/O2 mixtures: A computational investigation

Shuo Huang, Chad M. Huard, Seung‐Bo Shim et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2019 · 106 citations

Ar/c4f8/o2 Mixtures, Engineering, Abundant Fluxes +21

Photo–Roll Lithography (PRL) for Continuous and Scalable Patterning with Application in Flexible Electronics

Jong G. Ok, Moon Kyu Kwak, Chad M. Huard et al. · Advanced Materials · 2013 · 101 citations · Full text

Atomic layer etching of 3D structures in silicon: Self-limiting and nonideal reactions

Chad M. Huard, Yiting Zhang, Saravanapriyan Sriraman et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2017 · 64 citations

Ar/cl2 Plasmas, Engineering, Electron-beam Lithography +22

Transient behavior in quasi-atomic layer etching of silicon dioxide and silicon nitride in fluorocarbon plasmas

Chad M. Huard, Saravanapriyan Sriraman, Alex Paterson et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2018 · 64 citations

Engineering, Polymer Overlayer, Atomic Layer Etching +22

Highly stable and stretchable graphene–polymer processed silver nanowires hybrid electrodes for flexible displays

Qi Zhang, Yanfei Di, Chad M. Huard et al. · Journal of Materials Chemistry C · 2014 · 60 citations

Materials Science, Flexible Graphene–polymer, Electrical Engineering +15