Yiting Zhang

Atomic layer etching of 3D structures in silicon: Self-limiting and nonideal reactions

Chad M. Huard, Yiting Zhang, Saravanapriyan Sriraman et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2017 · 64 citations

Ar/cl2 Plasmas, Engineering, Electron-beam Lithography +22

Role of neutral transport in aspect ratio dependent plasma etching of three-dimensional features

Chad M. Huard, Yiting Zhang, Saravanapriyan Sriraman et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2017 · 60 citations · Full text

Engineering, Plasma Physics, Plasma Processing +18

Control of ion energy and angular distributions in dual-frequency capacitively coupled plasmas through power ratios and phase: Consequences on etch profiles

Yiting Zhang, Mark J. Kushner, Saravanapriyan Sriraman et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2015 · 55 citations

Engineering, Plasma Science, Plasma Physics +18

Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas

Yiting Zhang, Abdullah Zafar, David Coumou et al. · Journal of Applied Physics · 2015 · 54 citations · Full text

Multiple Radio Frequency, Electrical Engineering, Plasma Uniformity +11

Investigation of feature orientation and consequences of ion tilting during plasma etching with a three-dimensional feature profile simulator

Yiting Zhang, Chad M. Huard, Saravanapriyan Sriraman et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 42 citations

Plasma Electronics, Engineering, Physics +14